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Engineering Technology
Description: Thin film deposition techniques (sputtering, evaporation, CVD) are covered and associated metrology practices are discussed. X-ray spectroscopy, including XPS and XRD to study elemental composition, chemical states, and crystal structure are explored. The fundamentals of optical/electron beam lithography and related measurements, including critical dimension are discussed. Letter grade only.
Units: 3
No sections currently offered.
Prerequisite: ET 202 Corequisite: ET 315
Engineering Technology
Term : Spring 2026
Catalog Year : 2025-2026
ET 416 - Thin Film And Lithography Metrology
Description: Thin film deposition techniques (sputtering, evaporation, CVD) are covered and associated metrology practices are discussed. X-ray spectroscopy, including XPS and XRD to study elemental composition, chemical states, and crystal structure are explored. The fundamentals of optical/electron beam lithography and related measurements, including critical dimension are discussed. Letter grade only.
Units: 3
No sections currently offered.
Prerequisite: ET 202 Corequisite: ET 315